• DocumentCode
    968943
  • Title

    Integrated Thin-Film Circuits

  • Author

    Maissel, L. ; Simmons, J. ; Casey, M.

  • Author_Institution
    IBM Corporation,N.Y.
  • Volume
    8
  • Issue
    2
  • fYear
    1961
  • fDate
    6/1/1961 12:00:00 AM
  • Firstpage
    70
  • Lastpage
    79
  • Abstract
    This paper describes the fabrication of microminiaturized circuitry using sputtered metals. Experiments proved that it was possible, with special techniques, to use a photosensitive resist (Kodak Metal Etch Resist) as a masking medium for the deposition of circuit components with accurate dimensions. In this instance, a single metal (tantalum) was used to form the passive components. The high sheet resistivity of stable tantalum films permits the fabrication of small resistors, while two-dimensional capacitors can be formed from anodically oxidized tantalum films. This facilitates a unfied approach to microminiaturization.
  • Keywords
    Conductivity; Costs; Fabrication; Integrated circuit reliability; Resistors; Resists; Sheet materials; Sputtering; Temperature; Thin film circuits;
  • fLanguage
    English
  • Journal_Title
    Component Parts, IRE Transactions on
  • Publisher
    ieee
  • ISSN
    0096-2422
  • Type

    jour

  • DOI
    10.1109/TCP.1961.1136596
  • Filename
    1136596