• DocumentCode
    969033
  • Title

    Electron-beam systems for precision micron and submicron lithography

  • Author

    Wilson, Alan D.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    71
  • Issue
    5
  • fYear
    1983
  • fDate
    5/1/1983 12:00:00 AM
  • Firstpage
    575
  • Lastpage
    584
  • Abstract
    This paper discusses the engineering of electron-beam systems for the generation of micron and submicron lithography. Design objectives and options for the electron-beam column, X-Y workpiece stage, laser interferometer, pattern generator, software, and general engineering are the major topics.
  • Keywords
    Electron beams; Electron optics; Instruments; Lithography; Optical interferometry; Optical scattering; Probes; Shape; Tungsten; Writing;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1983.12641
  • Filename
    1456909
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=969033