• DocumentCode
    975380
  • Title

    Thermally Stable Mirror Structures for Vertical-Conducting GaN/Mirror/Si Light-Emitting Diodes

  • Author

    Huang, Shao-Hua ; Horng, Ray-Hua ; Li, Szu-Lung ; Yen, Kuo-Wei ; Wuu, Dong-Sing ; Lin, Chao-Kun ; Liu, Heng

  • Author_Institution
    Nat. Chung Hsing Univ., Taichung
  • Volume
    19
  • Issue
    23
  • fYear
    2007
  • Firstpage
    1913
  • Lastpage
    1915
  • Abstract
    Vertical-conducting GaN/mirror/Si light-emitting diodes (LEDs) with thermally stable mirrors have been fabricated using a combination of wafer-bonding and laser liftoff techniques. The thermal stabilities of NiO-Ag, NiO-Ag-Ni, and NiO-Au-Ag mirrors and their effects on the performance of mirror-substrate LEDs were studied. It is found that the NiO-Ag-Ni mirror presents the best performance, where the specific contact resistance and the reflectivity can achieve 5.1times10-3 Omega-cm2 and 92% at 470 nm after oxidation annealing at 500degC for 10 min. The top Ni layer could protect the Ag mirror from clustering during the thermal treatment process. The output powers of the GaN-sapphire and GaN/mirror/Si LEDs with NiO-Au-Ag and NiO-Ag-Ni mirrors show 4.5, 4.3, and 13 mW, respectively.
  • Keywords
    III-V semiconductors; annealing; elemental semiconductors; gallium compounds; light emitting diodes; oxidation; silicon; GaN-Si; oxidation annealing; reflectivity; temperature 500 degC; thermal stabilities; thermally stable mirror structures; vertical-conducting light-emitting diodes; wafer-bonding; Annealing; Contact resistance; Gallium nitride; Laser stability; Light emitting diodes; Mirrors; Oxidation; Protection; Reflectivity; Thermal stability; GaN; laser liftoff; light-emitting diode (LED); thermally stable mirror; wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2007.908352
  • Filename
    4383192