• DocumentCode
    977164
  • Title

    High-resolution 128 x 96 nitride microdisplay

  • Author

    Choi, H.W. ; Jeon, C.W. ; Dawson, M.D.

  • Author_Institution
    Inst. of Photonics, Univ. of Strathclyde, Glasgow, UK
  • Volume
    25
  • Issue
    5
  • fYear
    2004
  • fDate
    5/1/2004 12:00:00 AM
  • Firstpage
    277
  • Lastpage
    279
  • Abstract
    Matrix-addressable arrays of InGaN micro-light-emitting diodes with 128 × 96 pixels and a resolution of 1200 dpi have been fabricated using a novel "sloped sidewall" process. The devices have been fabricated on InGaN blue and green wafers, emitting light at the wavelengths of 468 and 508 nm, respectively. A simple circuit, which enables the display of an arrow pattern with ∼60% of the pixels turned on, was used for device testing. At an injection current of 60 mA, the devices deliver 3.3 (blue) and 2.4 mW (green) of output power, corresponding to a luminance of more than 30 000 Cd/m2. These high-brightness and highly versatile devices are certainly an attractive form of emissive micro-display.
  • Keywords
    III-V semiconductors; light emitting diodes; microdisplays; semiconductor device manufacture; semiconductor device testing; 2.4 mW; 3.3 mW; 468 nm; 508 nm; 60 mA; InGaN; blue wafers; device testing; emitting light; green wafer; injection current; light-emitting diode; luminance; matrix-addressable arrays; micro-light-emitting diodes; nitride microdisplay; sloped sidewall process; Circuit testing; Displays; Electrodes; Gallium nitride; Light emitting diodes; Microdisplays; Organic light emitting diodes; Planarization; Power generation; Quantum well devices;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2004.826541
  • Filename
    1295106