DocumentCode
978005
Title
Cryogenic investigation of gate leakage and RF performances down to 50K of 0.2 mu m AlInAs/GaInAs/InP HEMTs
Author
Sylvestre, A. ; Crozat, P. ; Adde, R. ; de Lustrac, Andre ; Jin, Yichao ; Harmand, J.C. ; Quillec, M.
Author_Institution
Inst. d´Electronique Fondamentale, Univ. de Paris-Sud, Orsay, France
Volume
29
Issue
24
fYear
1993
Firstpage
2152
Lastpage
2154
Abstract
0.2 mu m Al0.48In0.52As/Ga0.47In0.53As LMHEMT on InP with an undoped GaInAs layer to reduce gate leakage have been realised and their DC and RF properties have been investigated at cryogenic temperatures. The cutoff maximum frequencies of oscillation Fmax up to 260 GHz are extrapolated at 50K from the maximum unilateral gain (MUG) determined using S-parameters measured up to 40 GHz, Evolution of gate leakage current and RF characteristics against gate and drain biases are presented between 50 and 300K.
Keywords
III-V semiconductors; S-parameters; aluminium compounds; cryogenics; gallium arsenide; high electron mobility transistors; indium compounds; leakage currents; solid-state microwave devices; 0 to 260 GHz; 0.2 micron; 50 to 300 K; Al 0.48In 0.52As-Ga 0.47In 0.53As-InP; AlInAs/GaInAs/InP HEMTs; DC performance; InP; LMHEMT; RF performances; S-parameters; cryogenic temperatures; cutoff frequency; gate leakage; maximum unilateral gain; microwave device; undoped GaInAs layer;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19931439
Filename
247629
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