• DocumentCode
    978005
  • Title

    Cryogenic investigation of gate leakage and RF performances down to 50K of 0.2 mu m AlInAs/GaInAs/InP HEMTs

  • Author

    Sylvestre, A. ; Crozat, P. ; Adde, R. ; de Lustrac, Andre ; Jin, Yichao ; Harmand, J.C. ; Quillec, M.

  • Author_Institution
    Inst. d´Electronique Fondamentale, Univ. de Paris-Sud, Orsay, France
  • Volume
    29
  • Issue
    24
  • fYear
    1993
  • Firstpage
    2152
  • Lastpage
    2154
  • Abstract
    0.2 mu m Al0.48In0.52As/Ga0.47In0.53As LMHEMT on InP with an undoped GaInAs layer to reduce gate leakage have been realised and their DC and RF properties have been investigated at cryogenic temperatures. The cutoff maximum frequencies of oscillation Fmax up to 260 GHz are extrapolated at 50K from the maximum unilateral gain (MUG) determined using S-parameters measured up to 40 GHz, Evolution of gate leakage current and RF characteristics against gate and drain biases are presented between 50 and 300K.
  • Keywords
    III-V semiconductors; S-parameters; aluminium compounds; cryogenics; gallium arsenide; high electron mobility transistors; indium compounds; leakage currents; solid-state microwave devices; 0 to 260 GHz; 0.2 micron; 50 to 300 K; Al 0.48In 0.52As-Ga 0.47In 0.53As-InP; AlInAs/GaInAs/InP HEMTs; DC performance; InP; LMHEMT; RF performances; S-parameters; cryogenic temperatures; cutoff frequency; gate leakage; maximum unilateral gain; microwave device; undoped GaInAs layer;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19931439
  • Filename
    247629