Ultra-black nickel-phosphorus alloy optical absorber

Author

Kodama, Shunichi ; Horiuchi, Masao ; Kunii, Toshihiro ; Kuroda, Kenji

Author_Institution

Anritsu Corp., Kanagawa, Japan

Volume

39

Issue

1

fYear

1990

fDate

2/1/1990 12:00:00 AM

Firstpage

230

Lastpage

232

Abstract

To develop an optical absorber for use in the measurement of optical power, the authors have investigated and evaluated ultrablack films of nickel-phosphorus alloy which were deposited on substrates using an electroless plating process and subsequently etched. Results of varying the plating and etching bath components and conditions were studied. The result was a superior optical absorber which has a spectral reflectance of about 0.1-0.2% and a low wavelength dependence in the wavelength range of 488-1550 nm. The absorber showed almost no change in two accelerated-aging environments: 2000 h in a dry-heat environment at 100°C, and 2000 h in a damp-heat environment at 85°C and 85% relative humidity

Keywords

laser variables measurement; light absorption; light reflection; nickel alloys; optical films; optical testing; optical variables measurement; phosphorus alloys; 488 to 1550 nm; Ni-P; accelerated-aging; damp-heat; dry-heat; electroless plating process; etching; laser power measurement; measurement of optical power; optical absorber; optical variables measurement; spectral reflectance; ultrablack films; wavelength dependence; Copper; Etching; Nickel alloys; Optical buffering; Optical films; Optical surface waves; Power lasers; Power measurement; Reflectivity; Surface morphology;

fLanguage

English

Journal_Title

Instrumentation and Measurement, IEEE Transactions on

Publisher

ieee

ISSN

0018-9456

Type

jour

DOI

10.1109/19.50450

Filename

50450