• DocumentCode
    985998
  • Title

    Static noise margin variation for sub-threshold SRAM in 65-nm CMOS

  • Author

    Calhoun, Benton H. ; Chandrakasan, Anantha P.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Virginia Univ., Charlottesville, VA
  • Volume
    41
  • Issue
    7
  • fYear
    2006
  • fDate
    7/1/2006 12:00:00 AM
  • Firstpage
    1673
  • Lastpage
    1679
  • Abstract
    The increased importance of lowering power in memory design has produced a trend of operating memories at lower supply voltages. Recent explorations into sub-threshold operation for logic show that minimum energy operation is possible in this region. These two trends suggest a meeting point for energy-constrained applications in which SRAM operates at sub-threshold voltages compatible with the logic. Since sub-threshold voltages leave less room for large static noise margin (SNM), a thorough understanding of the impact of various design decisions and other parameters becomes critical. This paper analyzes SNM for sub-threshold bitcells in a 65-nm process for its dependency on sizing, VDD, temperature, and local and global threshold variation. The VT variation has the greatest impact on SNM, so we provide a model that allows estimation of the SNM along the worst-case tail of the distribution
  • Keywords
    CMOS memory circuits; SRAM chips; integrated circuit design; integrated circuit modelling; 65 nm; CMOS process; SRAM device; static noise margin variation; CMOS logic circuits; Capacitance; Circuit noise; Digital circuits; Inverters; Logic circuits; Probability distribution; Random access memory; Temperature dependence; Voltage; SRAM; Sub-threshold; process variation; static noise margin; sub-threshold memory; voltage scaling;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2006.873215
  • Filename
    1644879