DocumentCode
988000
Title
Performance Comparison Between Metallic Carbon Nanotube and Copper Nano-Interconnects
Author
Maffucci, Antonio ; Miano, Giovanni ; Villone, Fabio
Author_Institution
DAEIMI, Univ. di Cassino, Cassino
Volume
31
Issue
4
fYear
2008
Firstpage
692
Lastpage
699
Abstract
This paper addresses the problem of scaling interconnects to nanometric dimensions in future very-large-scale integration applications. Traditional copper interconnects are compared to innovative interconnects made by bundles of metallic carbon nanotubes. A new model is presented to describe the propagation of electric signals along carbon nanotube (CNT) bundles, in the framework of the classical transmission line theory. A possible implementation of a future scaled microstrip based on CNT bundle is analyzed and compared to a conventional microstrip.
Keywords
VLSI; carbon nanotubes; copper; integrated circuit interconnections; microstrip lines; nanoelectronics; C; CNT bundles; Cu; classical transmission line theory; copper nanointerconnects; electric signal propagation; metallic carbon nanotube; scaled microstrip; very-large-scale integration; Carbon nanotubes; Copper; Current density; Electrons; Fabrication; Microstrip; Scattering; Thermal conductivity; Transmission line theory; Very large scale integration; Interconnects; metallic carbon nanotubes; nano-technology;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2008.2005001
Filename
4674529
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