• DocumentCode
    988000
  • Title

    Performance Comparison Between Metallic Carbon Nanotube and Copper Nano-Interconnects

  • Author

    Maffucci, Antonio ; Miano, Giovanni ; Villone, Fabio

  • Author_Institution
    DAEIMI, Univ. di Cassino, Cassino
  • Volume
    31
  • Issue
    4
  • fYear
    2008
  • Firstpage
    692
  • Lastpage
    699
  • Abstract
    This paper addresses the problem of scaling interconnects to nanometric dimensions in future very-large-scale integration applications. Traditional copper interconnects are compared to innovative interconnects made by bundles of metallic carbon nanotubes. A new model is presented to describe the propagation of electric signals along carbon nanotube (CNT) bundles, in the framework of the classical transmission line theory. A possible implementation of a future scaled microstrip based on CNT bundle is analyzed and compared to a conventional microstrip.
  • Keywords
    VLSI; carbon nanotubes; copper; integrated circuit interconnections; microstrip lines; nanoelectronics; C; CNT bundles; Cu; classical transmission line theory; copper nanointerconnects; electric signal propagation; metallic carbon nanotube; scaled microstrip; very-large-scale integration; Carbon nanotubes; Copper; Current density; Electrons; Fabrication; Microstrip; Scattering; Thermal conductivity; Transmission line theory; Very large scale integration; Interconnects; metallic carbon nanotubes; nano-technology;
  • fLanguage
    English
  • Journal_Title
    Advanced Packaging, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1521-3323
  • Type

    jour

  • DOI
    10.1109/TADVP.2008.2005001
  • Filename
    4674529