DocumentCode
993749
Title
Permanent magnet configurations for magnetic-field-enhanced RIE
Author
Yonnet, Jean-Paul ; Picard, Alain
Author_Institution
Lab. d´´Electrotech. de Grenoble, Saint Martin d´´Heres, France
Volume
26
Issue
1
fYear
1990
fDate
1/1/1990 12:00:00 AM
Firstpage
290
Lastpage
296
Abstract
Several permanent magnet systems have been developed to enhance the reactive ion etching (RIE) of wafers. A new system, running with rotating bar-shaped magnets, that provides a traveling magnetic field in the wafer area is presented. This configuration is well adapted to obtaining fast and uniform etching
Keywords
magnetic fields; permanent magnets; sputter etching; magnetic-field-enhanced RIE; permanent magnet systems; reactive ion etching; rotating bar-shaped magnets; traveling magnetic field; uniform etching; Electrons; Etching; Inductors; Magnetic confinement; Magnetic fields; Permanent magnets; Plasma applications; Plasma confinement; Plasma density; Very large scale integration;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.50556
Filename
50556
Link To Document