Title of article :
Comparative study of the monolayers of CH3(CH2)nSiCl3 and CH3(CH2)nPO(OH)2, n = 4 and 13, adsorbed on polycrystalline titanium substrates
Author/Authors :
G. Philippin، نويسنده , , J. Delhalle، نويسنده , , Z. Mekhalif، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Abstract :
The purpose of this contribution is to compare the quality of adsorbed films of CH3(CH2)nSiCl3 and CH3(CH2)nPO(OH)2, n=4 and 13. Mechanically polished polycrystalline titanium substrates were reacted with 10−3 M solutions of the compounds in ethanol for the n-alkanephosphonic acids and in toluene for the n-alkyltrichlorosilanes. Assessments of the films have been carried out with X-ray photoelectron spectroscopy (XPS), contact angle measurements and electrochemical impedance spectroscopy (EIS). n-Alkyltrichlorosilanes form better quality monolayers than n-alkanephosphonic acids.
Keywords :
Polycrystalline titanium , n-Pentanephosphonic acid , n-Tetradecanephosphonic acid , n-Pentyltrichlorosilane , n-Tetradecyltrichlorosilane
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science