Title of article
Thickness dependence of the LUMO position for phthalocyanines on hydrogen passivated silicon (1 1 1)
Author/Authors
M. Gorgoi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
138
To page
143
Abstract
Inverse photoemission spectroscopy (IPES) was employed to study the density of unoccupied electronic states of fluorinated
and non-fluorinated cooper phthalocyanine layers deposited onto hydrogen passivated Si(1 1 1) substrates. For the nonfluorinated
cooper phthalocyanine (CuPc) the lowest unoccupied molecular orbital (LUMO) is found to shift gradually towards
the Fermi level with increasing film thickness. The shift amounts to 400 meV and appears for film thicknesses between one
monolayer and 10 nm. This finding complements previous results obtained using ultraviolet photoemission spectroscopy where
the highest occupied molecular orbital (HOMO) was found to shift as a function of film thickness. Fluorinated cooper
phthalocyanine (F16CuPc) shows the opposite behaviour, that is the distance between LUMO and Fermi level is increasing by
1.2 eV.
# 2004 Elsevier B.V. All rights reserved.
Keywords
Inverse photoemission , LUMO , Fluorinated copper phthalocyanine , Copper phthalocyanine
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
1000103
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