Deposition of 10-undecenoic acid self-assembled layers on H–Si(1 1 1) surfaces studied with AFM and FT-IR

Self-assembling layers of 10-undecenoic acid (UA) were deposited on H-terminated Si(1 1 1) surfaces and characterized with atomic force microscopy (AFM) and Fourier-transform infrared (FT-IR) spectroscopy measurements for the first time. The unique island structures are deposited by layer-by-layer growth mechanism. The IR spectra suggest that the multilayers grown over the first monolayer are deposited by weak intermolecular interactions such as Van der Waals force and hydrogen bonding