Characterization of pulsed plasma-ion streams emitted from RPI-type devices applied for material engineering

The paper reports on studies of pulsed plasma-ion streams generated by rod plasma injectors (RPI), and particularly by the IBIS device used for modifications of different materials. Measurements showed that the energy flux density can be from 5 to 25 J/cm2, and the corresponding pressure—from 0.5 to 2.5 bars. Spectroscopic measurements showed that the electron concentration (Ne) amounts to ð1:5 3:5Þ 1016 cm 3; and the electron temperature (Te)—to 1.5–6 eV. A study of the interaction of pulsed plasma streams with reversible getters (made of Zr50V50 alloys) showed that a shielding layer has an average density >1017 cm 3 and it reduces the transmitted energy flux considerably (to 30–60%), what makes possible the shielding of material surfaces.