Title of article :
Electrical and mechanical properties of surfactant-templated
mesoporous silica thin films using Brij-76 surfactant
Author/Authors :
Sang-Bae Jung، نويسنده , , Choo-Kyung Han، نويسنده , , Hyung-Ho Park، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
Ordered mesoporous silica films using Brij-76 surfactant were prepared from self-assembly of organic–inorganic species and
their electrical/mechanical properties were investigated for low-k application. X-ray diffraction pattern revealed highly textured
pore structure. Adequate dielectric properties could be realized by controlling the chemical species of silica wall. Porosity of
mesoporous silica film was 39 2% and elastic modulus and hardness of the film were 14.4 and 1.25 GPa, respectively. The
dielectric constant and leakage current density were measured as 2.55 and less than 2 10 6 A/cm2 up to 1.6 MV/cm,
respectively.
Keywords :
low-k , Brij-76 , Surfactant , Mesoporous silica films , Ordered
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science