• Title of article

    Optical effects in silica glass during implantation of 60 keV Cu ions

  • Author/Authors

    O.A. Plaksin، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    5
  • From page
    79
  • To page
    83
  • Abstract
    Spectra of the optical transmission and ion-induced photon emission (IIPE) of silica glass were measured during implantation of 60 keV Cu ions at ion fluxes from 1 to 75 mA/cm2 up to a fluence of 2 1017 ions/cm2, aimed at monitoring the formation of Cu nanoparticles. The precipitation threshold of Cu atoms is flux-dependent. At fluxes from 1 to 10 mA/cm2, the formation of nanoparticles is efficient up to fluences of 2 1017 ions/cm2. The efficiency of IIPE of Cu+ solutes in silica glass (band at 2.25 eV) is proportional to a total concentration of Cu solutes. In a single-phase region (solid solution of Cu atoms), the efficiency of IIPE of Cu+ solutes is flux-independent. In a two-phase region (solid solution and Cu nanoparticles), the dynamic balance between the nanoparticles and Cu solutes determines the flux-dependent behavior of the efficiency of IIPE.
  • Keywords
    Silica glass , In situ optical transmission , Ion-induced photon emission , Heavy-ion implantation , metal nanoparticles
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1000822