Title of article
(Zr, Sn)TiO4 thin films for application in electronics
Author/Authors
M. Nistor، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
6
From page
169
To page
174
Abstract
Thin films of zirconium tin titanate, (Zr0.8Sn0.2)TiO4 (ZST) were deposited using a pulsed electron beam source based on a
channel-spark discharge for target ablation. An advanced degree of crystallization was obtained for the films deposited on
alumina substrate post-annealed at 1000 8C. The crystalline lattice constants of the films are very close to those of the target
material, which confirms the same stoichiometry in ZST films and in the bulk.
Keywords
Zirconium tin titanate , Pulsed electron deposition , thin films
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1001096
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