Title of article :
Ti/Al p-GaN Schottky barrier height determined by
C–V measurements
Author/Authors :
Jae Wook Kim، نويسنده , , Jhang Woo Lee *، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
Data are presented on the rigorous method of capacitance–voltage (C–V) measurements to the barrier height of Ti/Al p-GaN
Schottky junction. For a sample with Hall concentration of 5.5 1016/cm3 the upper limit of the modulation frequency leading
the full response of the activated carriers is defined as 1.5 kHz from the capacitance versus modulation frequency (C– f ) plot. The
activation energy of the Mg acceptors determined from the temperature-dependent C– f plot is 0.12 eV. The barrier height
estimated with this activation energy and the intercept voltage of the 1/C2–V plot drawn with the 1.5 kHz C–V data is 1.43 eVat
300 K and 1.41 eV at 500 K. This is the most reliable barrier height ever reported. A reliable room temperature C–V doping
profile is demonstrated using the 1.5 KHz modulation, which is sensitive enough to resolve the presence of a 15 nm thin highly
doped (8 1018/cm3) layer formed near the surface.
Keywords :
GaN , Barrier height , C–V characteristics
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science