• Title of article

    Laboratory LPP EUV reflectometer working with non-polarized radiation

  • Author/Authors

    Ludwig van Loyen، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    4
  • From page
    57
  • To page
    60
  • Abstract
    A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance and the center wavelength are reproduced in relative standard deviation of 0.2 and 0.02%, respectively. In contrast to measurements using linearly polarized s-adjusted synchrotron radiation at PTB, measurements with non-polarized radiation at the EUVR yield systematically lower values for the reflectance due to the smaller reflectance of the p-component at higher angles of incidence
  • Keywords
    lithography , At-wavelength characterization , reflectometry , Extreme ultraviolet , Metrology
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1001412