Title of article :
Laboratory LPP EUV reflectometer working
with non-polarized radiation
Author/Authors :
Ludwig van Loyen، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden
using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance and the center wavelength are reproduced in
relative standard deviation of 0.2 and 0.02%, respectively. In contrast to measurements using linearly polarized s-adjusted
synchrotron radiation at PTB, measurements with non-polarized radiation at the EUVR yield systematically lower values for the
reflectance due to the smaller reflectance of the p-component at higher angles of incidence
Keywords :
lithography , At-wavelength characterization , reflectometry , Extreme ultraviolet , Metrology
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science