Title of article
Laboratory LPP EUV reflectometer working with non-polarized radiation
Author/Authors
Ludwig van Loyen، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
57
To page
60
Abstract
A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden
using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance and the center wavelength are reproduced in
relative standard deviation of 0.2 and 0.02%, respectively. In contrast to measurements using linearly polarized s-adjusted
synchrotron radiation at PTB, measurements with non-polarized radiation at the EUVR yield systematically lower values for the
reflectance due to the smaller reflectance of the p-component at higher angles of incidence
Keywords
lithography , At-wavelength characterization , reflectometry , Extreme ultraviolet , Metrology
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1001412
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