Title of article :
Laboratory LPP EUV reflectometer working with non-polarized radiation
Author/Authors :
Ludwig van Loyen، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
4
From page :
57
To page :
60
Abstract :
A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance and the center wavelength are reproduced in relative standard deviation of 0.2 and 0.02%, respectively. In contrast to measurements using linearly polarized s-adjusted synchrotron radiation at PTB, measurements with non-polarized radiation at the EUVR yield systematically lower values for the reflectance due to the smaller reflectance of the p-component at higher angles of incidence
Keywords :
lithography , At-wavelength characterization , reflectometry , Extreme ultraviolet , Metrology
Journal title :
Applied Surface Science
Serial Year :
2005
Journal title :
Applied Surface Science
Record number :
1001412
Link To Document :
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