Abstract :
A lot of work has been carried out to prepare chemically homogeneous (1 0 0) silicon surfaces. The hydrogen-terminated
(1 0 0) silicon surfaces are the most promising ones, especially in view of their remarkable environmental stability. The simplest
way to produce hydrogen-terminated surfaces (attack in water solution of HF of a sacrificial, thermally grown, oxide) results in
strongly heterogeneous rough surfaces (although with prevailing dihydride terminations). These surfaces can, however, be
flattened and homogenized by treating them in H2 at high temperature (>850 C). The morphological and chemical changes
undergone by the surface during the treatment are studied X-ray photoelectron spectroscopy, atomic force microscopy, scanning
tunnelling microscopy, infrared absorption spectroscopy in the attenuated total reflection mode, reflection high energy electron
diffraction and thermal programmed desorption, and the mechanisms responsible for them are discussed.