Title of article
Optical simulation, optimized design and fabrication of (ZrO2)x–(Al2O3)1 x composite films with thin inserted TiO2 layers for ArF-line high transmission attenuated phase shift mask blank applications
Author/Authors
Fu-Der Lai *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
10
From page
996
To page
1005
Abstract
The tunable optical constants of the stoichiometric (ZrO2)x–(Al2O3)1 x composite films with thin inserted TiO2 layers are
simulated as p-phase shifters. The optimized composition range of the superlattices to be used as a high transmission attenuated
phase shift mask (HT-APSM) blank is found. The absorption edge shifts to the longer wavelengths when the thickness fraction of
the TiO2 layer increases. The optimized film for ArF-line HT-APSM blank applications must have the lower inspection
transmittance for the better inspection and the lower reflectance at the exposure wavelength for a better aerial image as p-phase
shifters, and they will be easier to fabricate than a superlattice. In order to find such a film, (ZrO2)x–(Al2O3)1 x composite films
with various inserted TiO2 layers are simulated. The optimal deposition processes of such a film are also determined. For
example, a (ZrO2)0.187–(Al2O3)0.813 composite film with two inserted TiO2 thin layers is fabricated. The optical properties are as
follows: a transmittance of 19.8%, a reflectance of 9.1%, a calculated phase shift of 181.58 at the exposure wavelength of
193 nm, and a transmittance of 18.9% at the inspection wavelength of 257 nm. Such a film should be used as an optimized HTAPSM
blank.
Keywords
ArF-line , High transmission attenuated phase shift mask , Reflection–transmittance method
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1001546
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