Title of article :
Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition
Author/Authors :
Xin Chen، نويسنده , , Fangjun Huang and Wenjie Guan، نويسنده , , Guojia Fang b، نويسنده , , X.Z. Zhao، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
7
From page :
1561
To page :
1567
Abstract :
Highly transparent conductive Al2O3 doped zinc oxide (AZO) thin films have been deposited on the glass substrate by pulsed laser deposition technique. The effects of substrate temperature and post-deposition annealing treatment on structural, electrical and optical properties of AZO thin films were investigated. The experimental results show that the electrical resistivity of films deposited at 240 8C is 6.1 10 4 V cm, which can be further reduced to as low as 4.7 10 4 V cm by post-deposition annealing at 400 8C for 2 h in argon. The average transmission of AZO films in the visible range is 90%. The optical direct band gap of films was dependent on the substrate temperature and the annealing treatment in argon. The optical direct band gap value of AZO films increased with increasing annealing temperature
Keywords :
Substrate temperature , Post-deposition annealing , AZO films , Pulsed laser deposition
Journal title :
Applied Surface Science
Serial Year :
2005
Journal title :
Applied Surface Science
Record number :
1001615
Link To Document :
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