• Title of article

    Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition

  • Author/Authors

    Xin Chen، نويسنده , , Fangjun Huang and Wenjie Guan، نويسنده , , Guojia Fang b، نويسنده , , X.Z. Zhao، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    7
  • From page
    1561
  • To page
    1567
  • Abstract
    Highly transparent conductive Al2O3 doped zinc oxide (AZO) thin films have been deposited on the glass substrate by pulsed laser deposition technique. The effects of substrate temperature and post-deposition annealing treatment on structural, electrical and optical properties of AZO thin films were investigated. The experimental results show that the electrical resistivity of films deposited at 240 8C is 6.1 10 4 V cm, which can be further reduced to as low as 4.7 10 4 V cm by post-deposition annealing at 400 8C for 2 h in argon. The average transmission of AZO films in the visible range is 90%. The optical direct band gap of films was dependent on the substrate temperature and the annealing treatment in argon. The optical direct band gap value of AZO films increased with increasing annealing temperature
  • Keywords
    Substrate temperature , Post-deposition annealing , AZO films , Pulsed laser deposition
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1001615