Title of article
Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition
Author/Authors
Xin Chen، نويسنده , , Fangjun Huang and Wenjie Guan، نويسنده , , Guojia Fang b، نويسنده , , X.Z. Zhao، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
7
From page
1561
To page
1567
Abstract
Highly transparent conductive Al2O3 doped zinc oxide (AZO) thin films have been deposited on the glass substrate by pulsed
laser deposition technique. The effects of substrate temperature and post-deposition annealing treatment on structural, electrical
and optical properties of AZO thin films were investigated. The experimental results show that the electrical resistivity of films
deposited at 240 8C is 6.1 10 4 V cm, which can be further reduced to as low as 4.7 10 4 V cm by post-deposition
annealing at 400 8C for 2 h in argon. The average transmission of AZO films in the visible range is 90%. The optical direct band
gap of films was dependent on the substrate temperature and the annealing treatment in argon. The optical direct band gap value
of AZO films increased with increasing annealing temperature
Keywords
Substrate temperature , Post-deposition annealing , AZO films , Pulsed laser deposition
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1001615
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