Title of article :
XPS and UPS study of Na deposition on thin film V2O5
Author/Authors :
Qi-Hui Wu، نويسنده , , A. Thissen، نويسنده , , W. Jaegermann، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Abstract :
The deposition of Na on thin film V2O5 has been study by using photoelectron spectroscopy. Vanadium ions are strongly
reduced due to the deposition of Na. Three kinds of Na species were observed on the surface: the first is assigned to intercalated
Na; the second is contributed to Na2O2; the third is appointed to metallic Na. The formation of Na2O2 leads to arise an emission
line at about 10.3 eV in the valence band spectra. The metallic Na will further react with the oxides substrate and form Na2O2 on
the surface in UHV chamber.
Keywords :
V2O5 , Na deposition , UPS , XPS
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science