Title of article :
XPS and UPS study of Na deposition on thin film V2O5
Author/Authors :
Qi-Hui Wu، نويسنده , , A. Thissen، نويسنده , , W. Jaegermann، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2005
Pages :
5
From page :
1801
To page :
1805
Abstract :
The deposition of Na on thin film V2O5 has been study by using photoelectron spectroscopy. Vanadium ions are strongly reduced due to the deposition of Na. Three kinds of Na species were observed on the surface: the first is assigned to intercalated Na; the second is contributed to Na2O2; the third is appointed to metallic Na. The formation of Na2O2 leads to arise an emission line at about 10.3 eV in the valence band spectra. The metallic Na will further react with the oxides substrate and form Na2O2 on the surface in UHV chamber.
Keywords :
V2O5 , Na deposition , UPS , XPS
Journal title :
Applied Surface Science
Serial Year :
2005
Journal title :
Applied Surface Science
Record number :
1001645
Link To Document :
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