Title of article :
Preparation of palladium film by coating photolysis
process using KrF or ArF excimer laser
Author/Authors :
Yoji Imai *، نويسنده , , Tatsuo Tsunoda، نويسنده , , Kiyoshi Kobayashi، نويسنده , , Akio Watanabe ، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
The preparation of palladium (Pd) films has been investigated using KrF or ArF laser irradiation on a Pd acetate (PdAc)
coated substrate. A crystalline Pd film could be obtained by KrF laser irradiation (fluence = 15–40 mJ/cm2) but PdAc was found
to remain in the film. An increase in the substrate temperature to 423 K decreased the inclusion of the unreacted precursor and
produced a better crystallinity. An amorphous and uniform Pd film composed of very fine particles was found to be formed by
this process under reduced pressure, which is probably due to the preferential ablation of the crystalline nuclei. ArF laser
irradiation is more effective for decomposing the PdAc and for producing a Pd film with a better crystallinity and no (or smaller)
organic inclusion
Keywords :
KrF laser , ArF laser , Pd acetate , PD , Coating photolysis process
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science