Title of article :
Inhibition of copper corrosion by self-assembled films of new Schiff bases and their modification with alkanethiols in aqueous medium
Author/Authors :
M. Ehteshamzade، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
11
From page :
2949
To page :
2959
Abstract :
The inhibitive action of self-assembled films derived from two ligands Schiff bases, including N,N0-ethylen-bis (salicylidenimine) and N,N0-ortho-phenylen-bis (salicylidenimine) on copper surface has been studied by electrochemical techniques in chloride and acidic solutions. It was found that when the concentration of the inhibitors was increased the inhibition efficiency was increased, too. The results of the electrochemical studies have illustrated that the inhibition efficiency of S-o-ph-S is higher than S-E-S. Both the Schiff bases obeyed the Langmuir isotherm and thermodynamics calculations revealed that S-o-ph-S had larger adsorption constant and more negative free energy of adsorption with respect to S-E-S.When the films were modified by propanethiol and 1-dodecanethiol, the corrosion resistance of mixed films was significantly increased.
Keywords :
Schiff bases , Corrosion inhibitors , acidic medium , Chloride medium , Self-assembled films , copper
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1001795
Link To Document :
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