Title of article :
PLD of Fe3O4 thin films: Influence of background gas on surface morphology and magnetic properties
Author/Authors :
M.L. Parameˆs، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
4610
To page :
4614
Abstract :
Ablation of Fe3O4 targets has been performed using a pulsed UV laser (KrF, l = 248 nm, 30 ns pulse duration) onto Si(100) substrates, in reactive atmospheres of O2 and/or Ar, with different oxygen partial pressures. The as-deposited films were characterised by atomic force microscopy (AFM), X-ray diffraction (XRD), conversion electron Mo¨ssbauer spectroscopy (CEMS) and extraction magnetometry, in order to optimise the deposition conditions in the low temperature range. The results show that a background mixture of oxygen and argon improves the Fe:O ratio in the films as long as the oxygen partial pressure is maintained in the 10 2 Pa range. Thin films of almost stoichiometric single phase polycrystalline magnetite, Fe2.99O4, have been obtained at 483 K and working pressure of 7.8 10 2 Pa, with a high-field magnetization of 490 emu/cm3 and Verwey transition temperature of 112 K, close to the values reported in the literature for bulk magnetite.
Keywords :
Fe3O4 thin film , Pulsed laser deposition , Magnetic characterisation
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1002042
Link To Document :
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