Title of article :
Charge transfer in the atomic structure of Ge (1 0 5)
Author/Authors :
Y. Fujikawa، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
5244
To page :
5248
Abstract :
Abstract The atomic structure and charge transfer on the Ge (1 0 5) surface formed on Si substrates are studied using scanning tunneling microscopy and spectroscopy (STM and STS). The bias-dependent STM images of the whole Ge (1 0 5) facets formed on a Ge ‘‘hut’’ structure on Si (0 0 1) are observed, which arewell explained by the recently confirmed structure model. The local surface density of states on theGe (1 0 5) surface ismeasured by STS. The localization of the electronic states expected from charge transfer mechanism is observed in the dI/dV spectra. The surface band gap is estimated as 0.8–0.9 eV, which is even wider than the bulk bandgap of Ge, indicating the strong charge transfer effect to make the dangling bonds stable. The shape of normalized tunnel conductance agrees with the theoretical band structure published recently by Hashimoto et al.
Keywords :
High-index surface , Scanning tunneling microscopy and spectroscopy , Silicon , germanium
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1002139
Link To Document :
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