Title of article :
Charge transfer in the atomic structure of Ge (1 0 5)
Author/Authors :
Y. Fujikawa، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Abstract
The atomic structure and charge transfer on the Ge (1 0 5) surface formed on Si substrates are studied using scanning tunneling microscopy and
spectroscopy (STM and STS). The bias-dependent STM images of the whole Ge (1 0 5) facets formed on a Ge ‘‘hut’’ structure on Si (0 0 1) are
observed, which arewell explained by the recently confirmed structure model. The local surface density of states on theGe (1 0 5) surface ismeasured
by STS. The localization of the electronic states expected from charge transfer mechanism is observed in the dI/dV spectra. The surface band gap is
estimated as 0.8–0.9 eV, which is even wider than the bulk bandgap of Ge, indicating the strong charge transfer effect to make the dangling bonds
stable. The shape of normalized tunnel conductance agrees with the theoretical band structure published recently by Hashimoto et al.
Keywords :
High-index surface , Scanning tunneling microscopy and spectroscopy , Silicon , germanium
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science