Title of article :
Structural and electrical characterization of
SxSe100 x thin films
Author/Authors :
M.M. El-Nahass، نويسنده , , M.A.M. Seyam، نويسنده , , H.E.A. El-Sayed and A.M. Hassanien، نويسنده , ,
A.M. Abd El-Barry، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Thin films of samples of the glassy SxSe100 x system with 0 x 7.28 have been prepared by thermal evaporation technique
at room temperature (300 K). X-ray investigations show that the structure of pure selenium (Se) does change seriously by the
addition of small amount of sulphur S 7.28%. The lattice parameters were determined as a function of sulphur content. Results
of differential thermal analysis (DTA) of the glassy compositions of the system SxSe100 x were discussed. The characteristic
temperatures (Tg, Tc and Tm) were evaluated. Dark electrical resistivities, r, of SxSe100 x thin films with different thicknesses
from 100 to 500 nm, were measured in the temperature range from 300 to 423 K. Two distinct linear parts with different
activation energies were observed. The variation of electrical resistivity of examined compositions has been discussed as a
function of the film thickness, temperature and the sulphur content. The application of Mott model for the phonon assisted
hopping of small polarons gave the same two activation energies obtained from the resistivity temperature calculations
Keywords :
Structural and electrical properties , SxSe100 x , chalcogenide , semiconductors , thin films
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science