The surface chemistry resulting from low-pressure plasma treatment of polystyrene: The effect of residual vessel bound oxygen

The surface chemistry of plasma treated polystyrene samples has been studied in a specially designed low-pressure argon discharge system incorporating in situ XPS analysis. By using an electrostatic grid biasing technique, the plasma source can also be used in a mode preventing ion interactions with the sample. The system, which utilizes a vacuum transfer chamber between plasma and XPS analysis has allowed us to differentiate between the level of oxygen incorporated at the polystyrene surface from residual gas during treatment and that from the exposure of the treated sample to the laboratory atmosphere. Using typical base pressures of about 5 10 3 Pa (4 10 5 Torr) the XPS results show that significant oxygen surface incorporation resulted from oxygen containing species in the plasma itself (i.e. water vapour with 2 10 3 Pa partial pressure). The surface concentration of O was measured at 7.6 at.%. Subsequent atmospheric exposure of the treated samples resulted in only a small increase (of 0.6 at.%) in oxygen incorporation in the form of acid anhydride functionalities. XPS measurements of PS samples exposed to plasmas with no ion-surface component (i.e. exposure from VUV, UVand excited neutral species only) showed no appreciable change in oxygen incorporation compared to those with low-energy ion bombardment from the plasma (<20 eV). Given the energetics of the remaining bombarding species, it indicates that VUV radiation may be chiefly responsible for the production of free radical sites in this discharge regime