Abstract :
A review of the techniques and applications of multichannel ellipsometry in the dual-rotating-compensator configuration is given. This
ellipsometric approach has been established as the ultimate in real-time, single-spot optical measurement, as it determines the entire 16-element
Mueller matrix of a sample over a wide spectral range (up to 1.7–5.3 eV) from raw data collected over a single optical period of 0.25 s. The
sequence of optical elements for this ellipsometer is denoted PC1rSC2rA, where P, S, and A represent the polarizer, sample, and analyzer. C1r and C2r
represent two MgF2 rotating compensators, either biplates or monoplates that rotate synchronously at frequencies of v1 = 5v and v2 = 3v, where
p/v is the fundamental optical period. Previous high-speed Mueller matrix measurements with this instrument have been performed on uniform,
weakly anisotropic samples such as (110) Si, in which case one can extract the bulk isotropic and near-surface anisotropic optical responses
simultaneously. In such an application, the instrument is operated at its precision/accuracy limits. Here, ex situ results on a strongly anisotropic,
locally biaxial film are presented that demonstrate instrument capabilities for real-time analysis of such films during fabrication or modification. In
addition, the use of the instrument as a real-time probe to extract surface roughness evolution on three different in-plane scales for an isotropic film
surface is demonstrated for the first time.
Keywords :
Multichannel Mueller matrix ellipsometry , Surface roughnessevolution , Ellipsometry data analysis , Optical anisotropy , Dual-rotating-compensator ellipsometer