Title of article :
Effect of Al content on the properties of Cr1 xAlxC films
prepared by RF reactive magnetron sputtering
Author/Authors :
Tsow-Chang Fu، نويسنده , , Guo-Wei Ling، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Abstract :
Cr1 xAlxC films were deposited on high-speed steel by RF reactive magnetron sputtering. In this study, we aimed to identify the effect of the Al
content on the properties of Cr1 xAlxC films. We found that Cr1 xAlxC films exhibited a fine columnar grain microstructure with some special
characteristics, such as high hardness of Hv 1426, a low friction coefficient of 0.29, and a large contact angle of 908 for x = 0.18. Furthermore, an
increase in Al content resulted in a decrease in film hardness and an increase in contact angle. Moreover, on annealing at 923 K, the mechanical
properties of the films improved and a dense protective film of complex Cr2O3 and Al2O3 oxides was formed on the surface for better wear
resistance, which will ultimately increase the lifetime of the high-speed steel substrate.
Keywords :
sputtering , Chromium carbides , aluminum
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science