Title of article :
Effect of Al content on the properties of Cr1 xAlxC films prepared by RF reactive magnetron sputtering
Author/Authors :
Tsow-Chang Fu، نويسنده , , Guo-Wei Ling، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
1260
To page :
1264
Abstract :
Cr1 xAlxC films were deposited on high-speed steel by RF reactive magnetron sputtering. In this study, we aimed to identify the effect of the Al content on the properties of Cr1 xAlxC films. We found that Cr1 xAlxC films exhibited a fine columnar grain microstructure with some special characteristics, such as high hardness of Hv 1426, a low friction coefficient of 0.29, and a large contact angle of 908 for x = 0.18. Furthermore, an increase in Al content resulted in a decrease in film hardness and an increase in contact angle. Moreover, on annealing at 923 K, the mechanical properties of the films improved and a dense protective film of complex Cr2O3 and Al2O3 oxides was formed on the surface for better wear resistance, which will ultimately increase the lifetime of the high-speed steel substrate.
Keywords :
sputtering , Chromium carbides , aluminum
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1003000
Link To Document :
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