Title of article :
Anisotropic diffusion of Cu adatoms on strained Cu (1 1 1) surface
Author/Authors :
Y.X. Wang، نويسنده , , Z.Y. Pan، نويسنده , , T.J. Liu، نويسنده , , X.M. Jiang، نويسنده , , L. Zhou، نويسنده , , J. Zhu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
1748
To page :
1752
Abstract :
Diffusion of Cu atoms on a strained Cu (1 1 1) surface was studied by molecular dynamic simulation using an EAM potential. The anisotropic diffusion behaviour is found when the uniaxial strain is imposed on the surface, which does not exist under the biaxial strain. The migration of the adatom is suppressed along the tensile strain direction. The results suggest that different island morphology can be obtained by controlling anisotropic diffusion of adatoms on the strained surfaces during film growth.
Keywords :
Diffusion of adatoms , Strained Cu (1 1 1) surface , Thin film growth , Molecular dynamic simulation
Journal title :
Applied Surface Science
Serial Year :
2006
Journal title :
Applied Surface Science
Record number :
1003081
Link To Document :
بازگشت