Title of article :
Characterization of In/Pd and Pd/In/Pd thin films by ellipsometric, XRD and AES methods
Author/Authors :
A.A. Wronkowska، نويسنده , , A. Wronkowski، نويسنده , , A. Bukaluk، نويسنده , , M. Trzcin´ski، نويسنده , , K. Okulewicz، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
5
From page :
3367
To page :
3371
Abstract :
Abstract In/Pd and Pd/In/Pd thin films were prepared by thermal evaporation on the SiO2 substrate in a vacuum. The structural and optical properties of the films were investigated by means of X-ray diffractometry (XRD), Auger electron spectroscopy (AES) and spectroscopic ellipsometry (SE). Auger depth profile studies were performed in order to determine the composition of elements in the Pd-In systems. Interdiffusion of metals was detected at room temperature. Optical properties of Pd-In composite layers formed due to the interdiffusion were derived from ellipsometric quantities C and D measured in the photon energy range 0.75–6.50 eV at different angles of incidence. The effective optical spectra show absorption peaks dependent on the composition of nonuniform films. The XRD patterns indicated formation of Pd1 xInx intermetallic phases in the samples.
Keywords :
Auger electron spectroscopy , Interdiffusion , Spectroscopic ellipsometry , X-ray diffractometry , Dielectric function , PdIn compounds
Journal title :
Applied Surface Science
Serial Year :
2007
Journal title :
Applied Surface Science
Record number :
1003336
Link To Document :
بازگشت