Title of article :
The surface leakage currents of CdZnTe wafers
Author/Authors :
Gangqiang Zha، نويسنده , , Wanqi Jie، نويسنده , , Tingting Tan، نويسنده , , and Peisen Li، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
4
From page :
3476
To page :
3479
Abstract :
The surface leakage currents (SLCs) and surface sheet resistances (SSRs) of CdZnTe (1 1 0), (1 1 1) A and (1 1 1) B surfaces after etching with Br–MeOH solution, chemo-mechanical polishing (CMP) and passivation were measured in the parallel stripe model, respectively. Meanwhile the surface compositions were determined by X-ray photoelectron spectroscopy (XPS). Te enrichment introduced by etching with Br–MeOH resulted in the increase of the SLCs of CdZnTe wafers. After chemo-mechanical polishing, Te enrichment was removed, and SLCs decreased. CdZnTe (1 1 1) B without Te enrichment possesses higher SLC than that of (1 1 1) A, and (1 1 0) surface has the lowest SLC, which should be attributed to the lower surface dangling bonds. Passivation treatment with NH4F + H2O2 is an effective method to decrease SLCs of CdZnTe, by which the SLC was decreased two orders
Keywords :
Surface leakage current , CdZnTe , Surface sheet resistance , Chemo-mechanical polishing , Passivation
Journal title :
Applied Surface Science
Serial Year :
2007
Journal title :
Applied Surface Science
Record number :
1003355
Link To Document :
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