Formation of ?c texture of tungsten disulfide thin films with nickel

The formation of ?c texture of WS2 thin films by solid state reaction between the spray deposited WO3 and gaseous sulfur vapours with Ni interfacial layer has been reported. X-ray diffraction technique has been used to measure the degree of preferred orientation and texture of WS2 films. Scanning electron microscopy, transmission electron microscopy and atomic force microscopy have been used to characterize the microstructure and morphology. The electronic structure and chemical composition was studied using X-ray photoelectron spectroscopy. The WS2 films comprise single crystalline quality hexagonal crystallites of 15 mm 15 mm size with their basal planes parallel to the substrate. The film consists of turbostratic stacking sequence of 2H and 3R polytypes of WS2. The tungsten-to-sulfur ratio was estimated to be 1:1.8. The various qualitative models used to explain promotional effects are briefly outlined and the plausible underlying mechanism of formation of ?c texture with nickel, in this study, is given.