Title of article :
Current conduction mechanism in Al/p-Si Schottky barrier diodes
with native insulator layer at low temperatures
Author/Authors :
S¸. Alt?ndal، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Abstract :
The forward bias current–voltage (I–V) characteristics of Al/p-Si (MS) Schottky diodes with native insulator layer were measured in the
temperature range of 80–300 K. The obtained zero bias barrier height FB0(I–V), ideality factor (n) and series resistance (Rs) determined by using
thermionic emission (TE) mechanism show strong temperature dependence. There is a linear correlation between the FB0(I–V) and n because of
the inhomogeneties in the barrier heights (BHs). Calculated values from temperature dependent I–V data reveal an unusual behaviour such that the
FB0 decreases, as the n and Rs values are increasing with decreasing absolute temperature, and these changes are more pronounced especially at
low temperatures. Such temperature dependence of BH is contradictory with the reported negative temperature coefficient of the barrier height. In
order to explain this behaviour we have reported a modification in the expression reverse saturation current Io including the n and the tunnelling
factor (aX1/2d) estimated to be 15.5. Therefore, corrected effective barrier height Fbef.(I–V) versus temperature has a negative temperature
coefficients (a = 2.66 10 4 eV/K) and it is in good agreement with negative temperature coefficients (a = 4.73 10 4 eV/K) of Si band
gap. In addition, the temperature dependent energy distribution of interface states density Nss profiles was obtained from the forward bias I–V
measurements by taking into account the bias dependence of the Fe and n. The forward bias I–V characteristics confirm that the distribution of Nss,
Rs and interfacial insulator layer are important parameters that the current conduction mechanism of MS Schottky diodes.
Keywords :
Series resistance , Interface states , Native insulator layer , Conduction mechanisms , I–V characteristics
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science