FexNi100 x nanometric films deposited by laser ablation on SiO2/Si substrates

FexNi100 x nanometric films were deposited on SiO2/Si substrates at room temperature using the pulsed laser deposition technique. The targets were Fe–Ni amorphous magnetic foils with composition Fe50Ni50, Fe35Ni65 and Fe22Ni78. Morphological and structural properties of the deposited films were investigated using scanning electron microscopy, Rutherford backscattering spectrometry, grazing incidence X-ray diffraction, and Xray reflectivity. Electrical and magnetic characteristics of the films were investigated by using the four-point probe and the magneto-optic Kerr effect techniques, respectively. The film properties are strictly dependent on the Fe–Ni compositional ratio