Title of article :
The characteristics of platinum diffusion in n-type GaN
Author/Authors :
Der-Hwa Yeh، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
5
From page :
6910
To page :
6914
Abstract :
The electrical and optical characteristics of platinum (Pt) diffusion in n-type gallium nitride (GaN) film are investigated. The diffusion extent was characterized by the SIMS technique. The temperature-dependent diffusion coefficients of Pt in n-GaN are 4.158 10 14, 1.572 10 13 and 3.216 10 13 cm2/s at a temperature of 650, 750 and 850 8C, respectively. The Pt diffusion constant and activation energy in GaN are 6.627 10 9 cm2/s and 0.914 eV, respectively. These results indicate that the major diffusion mechanism of Pt in GaN is possibly an interstitial diffusion. In addition, it is also observed that the Pt atom may be a donor because the carrier concentration in Pt-diffused GaN is higher than that in un-diffused GaN. The optical property is studied by temperature-dependent photoluminescence (PL) measurement. The thermal quenching of the PL spectra for Pt-diffused GaN samples is also examined
Keywords :
GaN , Platinum diffusion , SIMS , activation energy , Diffusion coefficient , PL
Journal title :
Applied Surface Science
Serial Year :
2007
Journal title :
Applied Surface Science
Record number :
1003917
Link To Document :
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