Title of article :
Electron field emission from boron doped microcrystalline diamond
Author/Authors :
M. Roos، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
6
From page :
7381
To page :
7386
Abstract :
Field emission properties of hot filament chemical vapor deposited boron doped polycrystalline diamond have been studied. Doping level (NB) of different samples has been varied by the B/C concentration in the gas feed during the growth process and doping saturation has been observed for high B/C ratios. Threshold field (Eth) for electron emission as function of B/C concentration has been measured, and the influences of grain boundaries, doping level and surface morphology on field emission properties have been investigated. Carrier transport through conductive grains and local emission properties of surface sites have been figured out to be two independent limiting effects in respect of field emission. Emitter current densities of 500 nA cm 2 were obtained using electric fields less than 8 V/mm.
Keywords :
Emission propertiesof surface sites , Chemical vapor deposited diamond , Threshold field for electron emission , Boron doped diamond surface , Electron field emission
Journal title :
Applied Surface Science
Serial Year :
2007
Journal title :
Applied Surface Science
Record number :
1003993
Link To Document :
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