Title of article
Femtosecond and nanosecond laser damage thresholds of doped and undoped triazenepolymer thin films
Author/Authors
J. Bonse، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
7787
To page
7791
Abstract
The influence of pulse duration on the laser-induced damage in undoped or infrared-absorbing-dye doped thin triazenepolymer films on glass
substrates has been investigated for single, near-infrared (800 nm) Ti:sapphire laser pulses with durations ranging from 130 fs up to 540 fs and
complementarily for infrared (1064 nm) Nd:YAG ns-laser single-pulse irradiation. The triazenepolymer material has been developed for high
resolution ablation with irradiation at 308 nm. Post-irradiation optical microscopy observations have been used to determine quantitatively the
threshold fluence for permanent laser damage. In contrast to our previous studies on a triazenepolymer with different composition [J. Bonse, S.M.
Wiggins, J. Solis, T. Lippert, Appl. Surf. Sci. 247 (2005) 440], a significant dependence of the damage threshold on the pulse duration is found in
the sub-picosecond regime with values ranging from 500 mJ/cm2 (130 fs) up to 1500 mJ/cm2 (540 fs). Other parameters such as the film
thickness (50 nm and 1.1 mm samples) or the doping level show no significant influence on the material behavior upon irradiation. The results for
fs- and ns-laser pulse irradiation are compared and analyzed in terms of existent ablation models.
Keywords
Femtosecond laser damage , Triazenepolymer films , OPTICAL MICROSCOPY , Polymethylmethacrylate
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1004064
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