Title of article
Experimental investigation of ablation mechanisms involved in dry laser cleaning
Author/Authors
D. Grojo، نويسنده , , P. Caïs and A. Cros، نويسنده , , Ph. Delaporte، نويسنده , , M. Sentis، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
7
From page
8309
To page
8315
Abstract
The various ablation mechanisms possibly involved in ‘laser-particle-surface’ interaction were investigated by means of in situ diagnostics.
Different kind of transparent and absorbing particles were irradiated by UV nanosecond laser pulses. Optical microscopy was employed to measure
particle removal efficiencies and fluence thresholds. Fast imaging with the aid of an intensified charged coupled device (ICCD) camera was used to
characterize the ejection of species on a microsecond time scale. The present study shows that laser irradiation of particles can induce the damage
of surfaces as a result of near-field enhancement underneath particles and/or thermal contact with hot particles. During the experiments of laser
ablation of contaminants made of carbon-based materials, the contribution of the photochemical degradation was evaluated. The photochemical
ablation mechanism is of great interest for the removal of contaminates at low laser fluence. The results of this study are discussed in terms of
admissible mechanisms which lead to particle removal in dry laser cleaning experiments with nanosecond laser pulses.
Keywords
Dry laser cleaning , Photochemical ablation , Laser-particle-surface
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1004168
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