Evolution of self-assembled Ge/Si island grown by ion beam sputtering deposition

The effect of temperature and Ge coverage on the evolution of self-assembled Ge/Si islands grown by ion beam sputtering deposition is studied. Atomic force microscopy and Raman spectroscopy are used to analyze the island morphology and the intermixing between Si and Ge. The experiments are presented in two aspects. First, when the temperature is increased, intermixing is promoted, resulting in the reappearance of low aspect ratio islands. Second, a different evolution pathway is observed, in which short islands initially don’t grow along the constant ratio of 11:1 (diameter:height) and the islands always grow faster in vertical direction. In summary, the interdiffusion, surface diffusion, and amount of Ge determines the evolution of Ge/Si islands.