Title of article :
Effects of ZnO buffer layer on GZO RRAM devices
Author/Authors :
Jianwei Zhao، نويسنده , , Jian Sun، نويسنده , , Hai-Qin Huang، نويسنده , , Feng-Juan Liu، نويسنده , , Zuo-Fu Hu، نويسنده , , Xi-Qing Zhang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
4
From page :
4588
To page :
4591
Abstract :
Ag/GZO/ZnO/Pt structure resistive switching devices were fabricated by radio frequency (RF) magnetron sputtering, in which ZnO was used as a buffer layer. These devices have large ratio of high resistance state (HRS) to low resistance state (LRS), which is 2 × 103. The storage time measurement indicates that these devices have an excellent data retention characteristic. Moreover, the operation voltages are very low, which is 0.4 V (ON state) and −0.35/−0.55 V (OFF state). The electroforming process in initial state was not needed, and multistep reset process was found.
Keywords :
GZO , ReRAM devices
Journal title :
Applied Surface Science
Serial Year :
2012
Journal title :
Applied Surface Science
Record number :
1004815
Link To Document :
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