Synthesis and characterization of photochromic Ag-embedded TiO2 nanocomposite thin films by non-reactive RF-magnetron sputter deposition

Ag-embedded TiO2 nanocomposite thin film with reversible photochromic properties were prepared by layer-by-layer non-reactive RF-magnetron sputtering. Films were produced in Ar/O2 and pure Ar atmospheres. In the oxidizing regime, a diffusion of Ag from the film volume to the outer film surface was observed. Therefore, pure Ar plasma was applied in the deposition of TiO2. The electronic and optical properties of the TiO2 film were almost not affected by the presence of oxygen. Transmission electron microscopy (TEM) and reflection mode X-ray absorption spectroscopy (XAS) were performed to study the morphology, crystal structure and chemical state of the embedded Ag nanoparticles before and after the annealing step. Annealing of the film led to the crystallization of the TiO2 matrix. Moreover, the Ag nanoparticles in the film underwent Ostwald ripening leading to particle agglomerate. No oxidation of the embedded Ag during the sputter deposition and subsequent annealing process was found as confirmed by XAS measurements. The non-reactive RF-magnetron method is believed to avoid the energetic oxygen ions attack to Ag during the deposition of Ag-embedded TiO2 nanocomposite and thus the films are expected to have better optical properties and long-term stability.