Title of article :
Growth and transport properties of HT–LixCoO2 thin films deposited by pulsed laser deposition
Author/Authors :
E. Svoukis، نويسنده , , G.I. Athanasopoulos، نويسنده , , A. Moradpour، نويسنده , , O. Schneegans، نويسنده , , G. Dhalenne and A. Revcolevschi ، نويسنده , , J. Giapintzakis، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Abstract :
The successful in situ growth of single phase, c-axis oriented, layered structured LixCoO2 thin films on (0 0 0 1) Al2O3 substrates by pulsed laser deposition is reported. Thin films were grown in an oxygen pressure of 1 mbar and substrate temperatures varying from 300 up to 600 °C. It is found that the surface roughness and electrical resistance of the films depends strongly on the deposition temperatures.
Keywords :
LiCoO2 , Pulsed laser deposition , CP–AFM , Thin films
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
