Title of article
Fractal and multifractal analysis of LiF thin film surface
Author/Authors
R.P. Yadav، نويسنده , , S. Dwivedi، نويسنده , , A.K. Mittal، نويسنده , , M. Kumar، نويسنده , , A.C. Pandey، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
7
From page
547
To page
553
Abstract
Fractal and multifractal analysis is performed on the atomic force microscopy (AFM) images of the surface morphologies of the LiF thin films of thickness 10 nm, 20 nm, and 40 nm, respectively. Autocorrelation function, height–height correlation function, and two-dimensional multifractal detrended fluctuation analysis (MFDFA) are used for characterizing the surface. It is found that the interface width, average roughness, lateral correlation length, and fractal dimension of the LiF thin film increase with the thickness of the film, whereas the roughness exponent decreases with thickness. Thus, the complexity and roughness of the LiF thin films increases as thickness increases. It is also demonstrated that the LiF thin films are multifractal in nature. Strength of the multifractality increases with thickness of the film.
Keywords
LiF thin film , Height–height correlation , MFDFA , Fractal analysis , Multifractal analysis
Journal title
Applied Surface Science
Serial Year
2012
Journal title
Applied Surface Science
Record number
1005946
Link To Document