Chemical state and phase structure of (TaNbTiW)N films prepared by combined magnetron sputtering and PBII

(TaNbTiW)N films with thickness of ∼1000 nm are prepared on titanium alloy substrate by combined magnetron sputtering deposition and nitrogen plasma based ion implantation (N-PBII). Chemical state of the elements and phase structure of the films are investigated using X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD), respectively. The bonds of Tasingle bondN, Nbsingle bondN, Tisingle bondNsingle bondO and Tasingle bondO are detected in the (TaNbTiW)N films, however both Wsingle bondN and Wsingle bondO are not found. The initial alloy film has a BCC structure, while the films with N-PBII treatment are composed of BCC and FCC structures. The hardness and elastic modulus of the films can be improved by increasing nitrogen implantation dose and reach maximum values of 9.0 GPa and 154.1 GPa, respectively.