Efficient hydrogen production by photocatalytic water splitting using N-doped TiO2 film

N-doped TiO2 film was deposited by RF reactive magnetron sputtering in a mixture gas of N2, O2 and Ar. The experimental results show that the crystal structure is anatase phase, and the concentration of substitutional nitrogen is 4.91 at.% which leads to a narrow optical band gap of 2.65 eV. The H2 production rate of the N-doped TiO2 film is about 601 μmol g−1 h−1, far higher than that of the undoped TiO2 film and even about 50 times higher than that of dispersive P25 powder.