Title of article :
Scanning tunneling microscopy observation of initial growth of Sn and Ge1−xSnx layers on Ge(0 0 1) substrates
Author/Authors :
Masahiro Yamazaki and Keiichiro Nasu، نويسنده , , Shotaro Takeuchi، نويسنده , , Osamu Nakatsuka، نويسنده , , Akira Sakai، نويسنده , , Masaki Ogawa، نويسنده , , Shigeaki Zaima، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
4
From page :
6048
To page :
6051
Abstract :
We have investigated the initial growth of Sn and Ge1−xSnx layers on Ge(0 0 1) surface by using scanning tunneling microscopy. After the growth of a 0.035 ML-thick Sn layer at room temperature, Sn clusters lining vertically to a dimer row was observed. In the case of the 0.035–0.018 ML-thick Sn growth at 250 °C, the characteristic surface reconstruction with the step-edge undulation like a comb was observed. In the growth of a Ge0.994Sn0.006 layer at 250 °C, the multilayer polynuclear growth with a lot of two-dimensional small domain was observed. These surface reconstructions should be accounted for by the large compressive stress induced in the surface layer due to the incorporation of Sn atoms.
Keywords :
TIN , Scanning tunneling microscopy , Strain , Germanium
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009450
Link To Document :
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