Title of article :
Effects of In and Sb mono-layers to form rotated InSb films on a Si(1 1 1) substrate
Author/Authors :
Mitsufumi Saito، نويسنده , , Masayuki Mori، نويسنده , , Koichi Maezawa، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
3
From page :
6052
To page :
6054
Abstract :
A new method for InSb heteroepitaxial growth on a Si substrate was introduced in our previous work, in which an InSb film was formed via an InSb bi-layer. In the present work, to study the effects of In and Sb individual layers on the InSb film quality, InSb was deposited onto an InSb bi-layer, In mono-layer, and Sb mono-layer on a Si substrate. It was found that both In and Sb layers (in other words, InSb bi-layer) were essential to form a fine InSb film.
Keywords :
III–V semiconductors , Molecular beam epitaxy , X-ray diffraction
Journal title :
Applied Surface Science
Serial Year :
2008
Journal title :
Applied Surface Science
Record number :
1009451
Link To Document :
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