Title of article
X-ray photoelectron and Raman studies of microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films
Author/Authors
Bernard Humbert، نويسنده , , Nesrine Hellala، نويسنده , , Jean-Jacques Ehrhardt، نويسنده , , Silvère Barrat، نويسنده , , Elizabeth Bauer-grosse، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
10
From page
6400
To page
6409
Abstract
X-ray photoelectron and Raman spectroscopies were used to investigate the chemical and the structural properties of thin diamond films synthesised by Plasma Assisted Chemical Vapour Deposition (PACVD). Continuous polycrystalline diamond films were grown under different plasma conditions and based on the combination of detailed XPS and Raman spectroscopic analysis two main topics are highlighted (i) the stress measurements were discussed by distinguishing clearly the chemical effects from the mechanical effects; (ii) an electronic gap at 2.7 eV probed by Raman resonance that corresponds to an energy loss peak on the XPS carbon signal, was related to the surface hydrogenation.
Keywords
Diamond films , XPS , Raman , Chemical vapour deposition , Internal stresses , X-ray spectroscopy , Diamond , Stress measurements , Raman spectroscopy , Coatings
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009530
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